Symposium B – Photons and Low Energy Particles in Surface Processing
Research Article
Oxide Phase Formation in Excimer Laser Processed Ti Alloy
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- 25 February 2011, 397
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Characterization of the Depositing Flux in Laser Ablation Deposition (LAD).
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- Published online by Cambridge University Press:
- 25 February 2011, 405
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Dynamics of Graphite Photoablation
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- 25 February 2011, 411
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Growth Mechanism and Film Properties in Pulsed Laser-Plasma Deposition
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- 25 February 2011, 417
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In-Situ Ellipsometry Study of Pulsed Laser Deposited ZnO Films
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- 25 February 2011, 423
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Effects of Processing Parameters on KrF Excimer Laser Ablation Deposited ZrO2 Films
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- 25 February 2011, 429
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Synthesis and Characterization of PbO Films Grown by Pulsed Laser Deposition.
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- 25 February 2011, 437
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Processing of Y1Ba2Cu3O7-x Superconducting Thin Films on GaAs Substrates with Double Buffer Layers
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- 25 February 2011, 443
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Characterization of High Temperature Superconducting Thin Film Grown by Laser Ablation Method
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- 25 February 2011, 449
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In Situ Characterization of the Pulsed Laser DepositIon of Magnetic Thin Films
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- 25 February 2011, 455
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Low Temperature Synthesis of Carbide Thin Films by Pulsed Laser Deposition (Pld)
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- 25 February 2011, 461
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The Role of Hydrogen in Laser Deposition of Diamond-Like Carbon
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- 25 February 2011, 467
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Growth of Bn Thin Films by Pulsed Laser Deposition
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- 25 February 2011, 473
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Photophysics of Polyatomic Species Ejection Following Uv Laser Ablation of Single Crystal Bi2Sr2Ca1Cu2O8†
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- 25 February 2011, 479
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Comparison in Surface Modifications of Sintered and Single Crystal Ceramic Targets After Laser Ablation
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- 25 February 2011, 485
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Uhv-Tem Studies of Laser-Induced Damage in Silicon
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- 25 February 2011, 495
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Laser Damage Thresholds of Several Metal-Containing Acrylic Polymers at Four Different Wavelengths.
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- 25 February 2011, 501
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Dry Etching of Copper at High Rates
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- 25 February 2011, 507
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Photon-Single Phonon Coupling at Polar Crystal Surfaces: Infrared Optical Anisotropy Spectra
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- 25 February 2011, 511
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High Damage Threshold Optical Films for Excimer Lasers
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- 25 February 2011, 517
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