We report on the growth and properties of nanocrystalline Si superlattice solar cells. The solar cells consisted of a stack of alternating layers of amorphous and nanocrystalline Si. The thickness of each of the two layers in the superlattice structure was varied independently. It was found that when the nanocrystalline layer thickness was low, increasing the thickness of the amorphous layer in the superlattice systematically reduced the <220> grain size, while the <111> grain size remained essentially invariant. This fact shows that by interposing an amorphous layer between two nanocrystalline layers forces the nano grains to renucleate and regrow. It was also found that when the amorphous Si layer was too thick, there were significant problems with hole transport through the device. Measurements of defect densities and effective diffusion lengths showed that there was an optimum thickness of the amorphous layer (about 10 nm) for which the defect density was the lowest and the diffusion length was the highest. We also show that the absorption coefficient in nano Si depends upon the grain size and can be increased significantly by increasing the grain size.

Hydrogenated amorphous silicon carbide alloys are being investigated as a possible top photoelectrode in photoelectrochemical cells used for hydrogen production through water splitting. In order to be used as such, it is important that the effects of carbon concentration on bonding, and thus on the electronic and optical properties, is well understood. Electron spin resonance experiments were performed under varying experimental conditions to study the defect concentrations. The dominant defects are silicon dangling bonds. At room temperature, the spin densities varied between 1016 and 1018 spins/cm3 depending on the carbon concentration. Photothermal deflection spectroscopy, which is an extremely sensitive measurement of low levels of absorption in thin films, was performed to investigate the slope of the Urbach tail. These slopes are 78 meV for films containing the lowest carbon concentration and 98 meV for those containing the highest carbon concentration.

We report on the fabrication of nano-crystalline silicon-carbide (nc-SiC) using pulse modulated RF-PECVD technique, from silane (SiH4) and methane (CH4) gas mixtures which is highly diluted in hydrogen (H2). The microstructure of nc-SiC material is nanometer-size silicon crystallites embedded in amorphous silicon-carbide (a-SiC) matrix. As carbon incorporation in nc-Si film increases, the bandgap is enlarged from 1.1eV to 1.55eV as measured by Photothermal Deflection Spectroscopy (PDS) while the crystalline volume fraction decreases from 70% to about 20%. It is found that the crystalline volume fraction, grain size and dark conductivity of nc-SiC films can be enhanced with applying a negative DC bias to substrate during deposition.

Heterojunction with intrinsic thin layer (HIT) solar cells have achieved conversion efficiencies higher than 22%. Yet, many questions concerning the device physics governing these cells remain unanswered. We use numerical modeling to analyze the role of a-Si:H layers and tunneling on cell performance. For cells with n-type c-Si (n-HIT cells), incorporating the indium-tin-oxide (ITO) as an n-type semiconductor creates an n+/p/n structure. Most device simulations do not work with this structure. Our modeling indicates that the n+/p/n device often produces irregular S-shaped current density–voltage (J-V) curves, which have been observed experimentally but were not previously understood. However, if tunneling is included, there are specific conditions where the n+/p/n structure performs as a robust solar cell with efficiencies exceeding 20%. Additional analysis examines voltage-dependent carrier collection in n-HIT cells, as well as material and interface properties that limit fill factor. In p-HIT cells, modeling the ITO layer as a semiconductor, rather than as a metallic contact, significantly reduces the impact of a-Si:H layer parameters on device performance. In p-HIT cells, the a-Si:H layers adjacent to the ITO layer play the role of a buffer that reduces interface recombination at the a-Si:H/c-Si interface and prevents tunneling of electrons from the ITO layer to the c-Si absorber. Tunneling through the a-Si:H layers adjacent to the back contact is important to attain regular J-V curves.

The photoluminescence in a nc-Si/a-Si:H mixture has been investigated at varying excitation intensities, and temperatures We have also observed changes in the luminescence spectra, which are induced by sequential annealing at temperatures below the a-Si:H crystallization temperature (˜ 600°C). Two predominant luminescence peaks are observed at ˜ 0.95 eV and ˜ 1.30 eV, which are attributed to band tail-to-band tail transitions near the nc-Si grain boundaries and in the a-Si:H bulk, respectively. The 0.95 eV band saturates approaching 500 mW/cm2 excitation intensity. Annealing the nc-Si/a-Si:H mixture brings out a new low energy peak, centered at ˜ 0.70 eV, and which we believe to be due to oxygen defects.

Photoluminescence (PL) from hydrogenated silicon carbide (SiC:H) films is studied at room temperature. The films were deposited by plasma-enhanced chemical vapor (PECVD) technique with and without substrate bias using methyltrichlorosilane as a main precursor. After the deposition the samples were annealed at various temperatures in vacuum. The films were characterized by atomic force microscopy (AFM), Fourier transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD). The samples deposited without substrate bias (series A) were amorphous, whereas the samples deposited with negative substrate bias -100V (series B) were nanocrystalline. The one-peak (470 nm) and double-peak (415 and 437 nm) PL structures of the as-deposited samples A and B were observed, respectively. Annealing strongly enhanced intensity of PL of the samples B and trandformed PL spectrum from double-peak into broad featureless band with intensity at about 470 nm. The blue PL in as-deposited films B is supposed to be assigned to the radiative recombination in the sites located at the nanocrystallite surface, whereas the photo excitation of carries mostly occurs in nanocrystallite cores. A further increase in annealing temperature causes hydrogen effusion, which leads to an increase of the concentration of non-raidative recombination centers associated with dangling-bonds and as a result, to the quenching of PL.

We have developed high efficiency large area a-Si:H and a-SiGe:H multi-junction solar cells using a Modified Very High Frequency (MVHF) glow discharge process. We conducted a comparative study for different cell structures, and compared the initial and stable performance and light-induced degradation of solar cells made using MVHF and RF techniques. Besides high efficiency, the MVHF cells also demonstrate superior light stability, showing <10% degradation after 1000 hour of one-sun light soaking at 50 °C. We also studied light-induced defect level and hydrogen evolution characteristics of MVHF deposited a-SiGe:H films and compared them with the RF deposited films.

We report on structural, electronic, and optical properties of boron-doped, hydrogenated nanocrystalline silicon (nc-Si:H) thin films deposited by plasma-enhanced chemical vapor deposition (PECVD) at a substrate temperature of 150°C. Film properties were studied as a function of trimethylboron-to-silane ratio and film thickness. The film thickness was varied in the range from 14 to 100 nm. The conductivity of 60 nm thick films reached a peak value of 0.07 S/cm at a doping ratio of 1%. As a result of amorphization of the film structure, which was indicated by Raman spectra measurements, any further increase in doping reduced conductivity. We also observed an abrupt increase in conductivity with increasing film thickness ascribed to a percolation cluster composed of silicon nanocrystallites. The absorption loss of 25% at a wavelength of 400 nm was measured for the films with optimized conductivity deposited on glass and glass/ZnO:Al substrates. A low-leakage, blue-enhanced p-i-n photodiode with an nc-Si p-layer was also fabricated and characterized.

The generation of high frequency steady-state photoconductivity in nitrogen doped hydrogenated amorphous silicon (a-Si:H-N) films has been demonstrated at infrared (IR) frequencies of 650 to 2000 cm-1 or 15 to 5 μm in wavelength. This allows IR photoconductivity to be observed using a simple thermal source. In order to produce high frequency photoconductivity effects the plasma frequency must be increased to the desired device operation frequency or higher as described by the Drude model. IR ellipsometry was used to measure the steady-state permittivity of the a-Si:H-N films as a function of pump illumination intensity. The largest permittivity change was found to be Δεr = 2 resulting from a photo-carrier concentration on the order of 1022 cm-3. IR photoconductivity is shown to be limited by the effective electron mobility at IR frequencies.

We report our investigations of large area multi-junction solar cells based on hydrogenated nano-crystalline silicon (nc-Si:H). We compared results from cells deposited by RF (13.56 MHz) at lower deposition rate (˜3 Å/s) and by Modified Very High Frequency (MVHF) at higher rate (≥ 10 Å/s). With optimized process conditions and cell structures, we have obtained ˜12% initial small active-area (˜0.25 cm2) efficiency for both RF and MVHF cells and 10˜11% large aperture-area (˜400 cm2) encapsulated MVHF cell efficiency for both a-Si:H/nc-Si:H double-junction and a-Si:H/nc-Si:H/nc-Si:H triple-junction structures on Ag/ZnO coated stainless steel substrate.

We analyze the grain size distribution during solid phase crystallization of Silicon thin films. We use a model developed recently that offers analytical expressions for the time-evolution of the grain size distribution during crystallization of a d-dimensional solid. Contrary to the usual fit of the experimental results with a lognormal distribution, the theory describes the data from basic physical principles such as nucleation and growth processes. The theory allows for a good description of the grain size distribution except for early stages of crystallization. The latter case is expected and discussed. An important outcome of the model is that the distribution at full crystallization is determined by the time-dependence of the nucleation and growth rates of grains. In the case under consideration, the theory leads to an analytical expression that has the form of a lognormal-type distribution for the fully crystallized sample.

Hydrogenated amorphous silicon (a-Si:H) was deposited with the Expanding Thermal Plasma-CVD (ETP CVD) method utilizing pulse-shaped substrate biasing to induce controlled ion bombardment during film growth. The films are analyzed with in-situ real time spectroscopic ellispometry, FTIR spectroscopy, as well as reflection-transmission and Fourier transform photocurrent spectroscopy (FTPS) measurements. The aim of this work is to investigate the effect ion bombardment with well defined energy on the roughness evolution of the film and the material properties.

We observe two separate energy regimes with material densification and relatively constant defect density below ˜ 120-130 eV and a constant material density at increasing defect density > 120-130 eV substrate bias. We discuss our results in terms of possible ion – surface atom interactions and relate our observations to reports in literature.

Hydrogenated amorphous silicon (a-Si:H) has been extensively investigated experimentally in the infrared spectral region via techniques such as Fourier Transform Infrared (FTIR) and Raman spectroscopy. Although spectroscopic ellipsometry has been proven to be an important tool for the determination of several parameters of a-Si:H films, including dielectric constant, surface roughness, doping concentration and layer thickness, the spectral range used in these studies has rarely covered the infrared region below 0.6 eV, and never over the complete spectral region of interest (0.04 – 0.3 eV). We have measured for the first time the dielectric function of a-Si:H films grown by the saddle field glow discharge technique by spectroscopic ellipsometry in the energy range from 0.04 eV to 6.5 eV, thus extending the analysis into the far infrared region. The a-Si:H films were deposited on germanium substrates for the ellipsometry studies, and on crystalline silicon substrates for the comparative FTIR analysis. Preparation parameters were chosen to obtain films with different hydrogen content. In this paper, we present the results of the ellipsometry analysis, evaluate different fitting techniques, and compare the results with the corresponding FTIR spectra. The similarities and differences between the spectra are discussed in terms of the a-Si:H properties.

Light management and enhanced photon harvesting is a critical area for improving efficiency of thin film solar cells. Red and near infrared photons with energies just above the band edge have large absorption lengths in amorphous silicon and can not be efficiently collected. We previously demonstrated that a photonic crystal back reflector involving a periodically patterned ZnO layer can enhance absorption of band edge photons. We propose and design alternative new plasmonic crystal structures that enhance absorption in thin film solar cell structures. These plasmonic crystals consist of a periodically patterned metal back reflector with a periodic array of holes An amorphous/nanocrystalline silicon layer resides on top of this plasmonic crystal followed by a standard anti-reflecting coating. We have found plasmonic crystal structures enhance average photon absorption by more than 10%, and by more than a factor of 10 at wavelengths just above the band edge, and should lead to improved cell efficiency. The plasmonic crystal diffracts band edge photons within the absorber layer, increasing their path length and dwell time. In addition there is concentration of light within the plasmonic crystal. Design simulations are performed with rigorous scattering matrix simulations where both polarizations of light are accounted for.

We have investigated the effects of hydrogen plasma treatment on the hysteresis phenomenon and electrical properties of solid phase crystallized silicon thin film transistors (SPC-Si TFTs) employing alternating magnetic field crystallization (AMFC). We employed H2 plasma treatment on the SPC-Si active layer before SiO2 gate insulator deposition. By increasng the power and time duration of H2 plasma treatment, it was observed that hysteresis phenomenon of SPC-Si TFT was suppressed and electrical properties such as threshold voltage, field effect mobility was improved considerably. This is due to role of hydrogen atom by passivating the defects and grain boundary trap states in SPC-Si film. However, relatively high power and long hydrogen plasma treatment (100W, 5 minutes) could degrade the electrical characteristics of the device. SPC-Si TFT for 100W power of PECVD and 3 minutes with the H2 plasma treatment exhibit the significant improvement of electrical characterics (VTH = - 3.85V, μFE = 21.16cm2/Vs), and a smaller hysteresis phenomenon (∆VTH = -0.30V) which is suitable for high quality AMOLED Display.

The standard, time-of-flight method for measuring drift mobilities in semiconductors uses strongly absorbed illumination to create a sheet of photocarriers near an electrode interface. This method is problematic for solar cells deposited onto opaque substrates, and in particular cannot be used for hole photocarriers in hydrogenated amorphous silicon (a Si:H) solar cells using stainless steel substrates. In this paper we report on the extension of the time-of-flight method that uses weakly absorbed illumination. We measured hole drift-mobilities on seven a Si:H nip solar cells using strongly and weakly absorbed illumination incident through the n-layer. For thinner devices from two laboratories, the drift-mobilities agreed with each other to within our random error of about 15%. For thicker devices from United Solar, the drift-mobilities were about twice as large when measured using strongly absorbed illumination. We propose that this effect is due to a mobility profile in the intrinsic absorber layer in which the mobility decreases for increasing distance from the substrate.

An increasingly important application of thin film hydrogenated amorphous silicon (α-Si:H) is in infrared detection for microbolometer thermal imaging arrays. Such arrays consist of thin α-Si:H films that are integrated into a floating thermally isolated membrane structure. Among the α-Si:H material properties affecting the design and performance of microbolometers is the microstructure. In this work, Raman spectroscopy is used to study changes in the microstructure of protocrystalline p-type α-Si:H films grown by PECVD as substrate temperature, dopant concentration, and hydrogen dilution are varied. The films exhibit the four Raman spectral peaks corresponding to the TO, LO, LA, and TA modes. It is found that the TO Raman peak becomes increasingly well defined (decreasing line width and increasing intensity), and shifts towards the crystalline TO energy as substrate temperature is increased, H dilution of the reactants is increased, or as dopant concentration is decreased.

Blending of red and blue photoluminescent silicon nanocrystals (Si-ncs) with poly(3-hexylthiophene (P3HT) conjugated polymer is demonstrated. The room temperature luminescent and ambient conditions stable Si-ncs prepared by electrochemical etching and laser ablation in water are used for the blend fabrication. Furthermore photo-electric properties in parallel configuration on platinum interdugitated contact are shown. Both types of Si-ncs results the bulk-heterojunction formation and photoconductivity is observed when the blends are irradiated AM1.5. The increase in photoconductivity is rather the same and ratio between photo- and dark-conductivity is about 1.7. The nanocrystal oxidation during laser ablation fabrication process in water hinders the transport properties of the blend.

We analyzed the effect of electromechanical stressing on the electrical characteristics of hydrogenated amorphous silicon thin-film transistors. It had been shown that the TFTs, fabricated at 150 °C, respond to tension/compression by a rise/fall in electron mobility. In TFTs fabricated using the same process, a slight shift of threshold voltage was observed under prolonged high compressive strain and the gate leakage current slightly increases after ˜2% compressive strain. In general, the change of TFT performance due to pure mechanical straining is small in comparison to electrical gate-bias stressing. From the comparison among Maxwell stress (induced by electrical gate-bias stressing), mechanical stress (applied by bending), and drifting electrical force for passivated hydrogen atom, the most significant cause for the change of electrical characterization of a-Si:H TFTs should be the trapping charges inside the dielectric, under combined electrical and mechanical stressing. The mechanical stress does not act on Si-H bonds to drift hydrogen atoms, while it is mainly balanced by the rigid Si-Si networks in a-Si:H or a-SiNx. Therefore, mechanical stress has very little effect on the instability of low temperature processed a-Si:H TFTs.

Surface passivation of silicon substrates using atomic layer deposited Al2O3 and HfO2 thin films are assessed. Al2O3 and HfO2 dielectric layers with various thicknesses were deposited on both sides of n-type (100) FZ-Si substrates (resistivity 4 – 6 Ω-cm) at 200°C by atomic layer deposition (ALD) system. The effective excess carrier lifetime of as-deposited oxide/Si/oxide structure was measured by microwave-photoconductivity-decay (MWPCD) measurement technique and it was observed that the thicker ALD dielectrics lead to higher effective excess carrier lifetime and better surface passivation. The measurements showed average excess carrier lifetime values of 302 μs and 347 μs for as-deposited Al2O3 and HfO2 passivated Si substrates with 150 ALD cycles, respectively. MWPCD and capacitance-voltage (C-V) measurements suggest that as-deposited ALD HfO2 layer leads to a better surface passivation compared to as-deposited ALD Al2O3 layer. Further, the results suggest that there exist fixed negative charges in the bulk of the ALD dielectrics and this contributes to the field effect passivation of the silicon surfaces.