Nitridation of β-Ga2O3 to GaN in an atmosphere of NH3/Ar was investigated from the view points of kinetic results by thermogravimetric analysis (TGA) and microstructural observation. TGA and X-ray powder diffraction results showed that the nitridation of Ga2O3 to GaN starts at about 650°C and decomposition of GaN formed occurs from 870°C. Isothermal TGA results showed that the nitridation proceeds linearly with time at 800 – 1000°C. Microstructural observation of the samples nitrided at 800°C showed that fine GaN particles (∼50 nm size) deposit on surfaces of Ga2O3 particles at an early stage, and the deposits grow with progress of the nitridation.

AlGaN/GaN pH sensitive devices were functionalized and passivated for the use as selective bio-sensors. For the passivation, a multilayer of SiO2 and SiNx is proposed, which stabilizes the pH-sensor, is biocompatible and has no negative impact on the following bio-functionalization. The functionalization of the GaN-surface was achieved by covalent bonding of 10-amino-dec-1-ene molecules by a photochemical process. After two different surface preparations islands of TFAAD are growing on the sensor surface by exposure with UV-light. In dependence on the surface pre-treatment and the illumination wavelength the first monolayer is completed after 3 h or 7 h exposure time dependent on the pre-treatment and illumination wavelength. Further exposure results in thicker films as a consequence of cross polymerization. The bonding to the sensor surface was analyzed by X-ray photoelectron spectroscopy, while the thickness of the functionalization was determined by atomic force microscopy scratching experiments. These functionalized devices based on the pH-sensitive AlGaN/GaN ISFET will establish a new family of adaptive, selective biomolecular sensors such as selective, reusable DNA sensors.

AlGaN/GaN high electron mobility transistors (HEMTs) with a polarized Polyvinylidene difluoride (PVDF) film coated on the gate area exhibited significant changes in channel conductance upon exposure to different ambient pressures. The PVDF thin film was deposited on the gate region with an inkjet plotter. Next, the PDVF film was polarized with an electrode located 2 mm above the PVDF film at a bias voltage of 10 kV and 70 °C. Variations in ambient pressure induced changes in the charge in the polarized PVDF, leading to a change of surface charges on the gate region of the HEMT. Changes in the gate charge were amplified through the modulation of the drain current in the HEMT. By reversing the polarity of the polarized PVDF film, the drain current dependence on the pressure could be reversed. Our results indicate that HEMTs have potential for use as pressure sensors.

We report the terahertz (THz) emission from the wurzite indium nitride (InN) films grown by molecular beam epitaxy (MBE). More than two orders of magnitude of THz power enhancement has been achieved from the InN film grown along the a-axis and magnesium (Mg) doped InN with a critical carrier concentration. The primary radiation mechanism of the a-plane InN film is found to be due to the acceleration of photoexcited carriers under the polarization-induced in-plane electric field perpendicular to the a-axis. Apparent azimuthal angle dependences of THz wave amplitude and the second harmonic generation are observed from a-plane InN. In the Mg-doped films, Mg as the acceptors compensate the native donors in the InN films and large band bending over a wider space-charge region causes the enhancement of THz emission power compared to the undoped InN.

Magneto-optical properties of Ni- and Co-doped amorphous AlN thin films were investigated as a function of post grown annealing temperature using magneto-optical Kerr effect (MOKE) spectroscopy. The x-ray diffraction spectra confirmed that the as-grown material is amorphous and retained its morphology after thermal treatment; however the sample morphology strongly depends on the concentration of incorporated transition metals. We observed with help of transmission electron microscopy and atomic force microscopy that the films surface containing TMs with concentrations larger than ∼10 at.% undergo morphological changes suggesting possible Ni and Co atom clustering. Significant enhancement of the polar Kerr rotation signal was observed for Ni- and Co-doped a-AlN materials annealed above 300 °C in nitrogen. The studied materials have shown strong magnetic isotropy in polar geometry whereas the MOKE measurements in longitudinal geometry did not show an explicit signal for the transition metals doped a-AlN studied.

Planar Pt/AlGaN/GaN Schottky barrier diodes (SBDs) have been characterized by capacitance-voltage and capacitance deep-level optical spectroscopy measurements, compared to reference Pt/GaN:Si SBDs. Two specific deep levels are found to be located at ∼1.70 and ∼2.08 eV below the conduction band, which are clearly different from deep-level defects (Ec - 1.40, Ec - 2.64, and Ec - 2.90 eV) observed in the Pt/GaN:Si SBDs. From the diode bias dependence of the steady-state photocapacitance, these levels are believed to stem from a two-dimensional electron gas (2DEG) region at the AlGaN/GaN hetero-interface. In particular, the 1.70 eV level is likely to act as an efficient generation-recombination center of 2DEG carriers.

c-plane (0001) AlN layers were grown on sapphire (11-20) and (0001) substrates by hydride vapor phase epitaxy (HVPE) and metal-organic vapor phase epitaxy (MOVPE), respectively. The growth temperatures were adjusted from 1430-1500 °C and the reactor pressure was kept constant at 30 Torr. Mirror and flat c-plane AlN were obtained grown on both a-plane and c-plane sapphire. Crystalline quality and surface roughness are improved with increasing growth temperature, detected by high resolution X-ray diffraction (HRXRD) and atomic force microscopy (AFM). The Full widths at half maximum (FWHM) values of (10-12) diffraction are 519 and 1219 arcsec for c-plane AlN grown on a-plane sapphire and c-plane sapphire, respectively. It indicates that a-plane sapphire substrate benefits to decrease dislocations density.

We introduce the lasing principle and important characteristics of photonic-crystal surface-emitting laser (PC-SELs). Specifically, we demonstrate two-dimensional coherent lasing oscillation with GaN PC-SELs, using a unique crystal growth technique called “air hole retained overgrowth” (AROG). Above the threshold, we obtained a two-dimensionally distributed near-field pattern, and a distinctive far-field pattern with a divergence angle less than 1°. We also investigate a suitable sample structure for the reduction of the threshold current, where the PC structure is moved from an n-cladding layer to a p-cladding one. This is an important step towards the realization of novel light sources that can be integrated two dimensionally for a variety of new scientific and engineering applications in the blue to ultraviolet wavelengths.

The incorporation of small amounts of N into III-V antimonide-containing semiconductor alloys allows a drastic expansion of available wavelengths for infrared (IR) detector applications. Quaternary films containing three group-V elements can be lattice matched to the most prevalent substrates for IR applications, such as InAs, GaAs, and GaSb. It is not trivial to incorporate N while maintaining the high crystalline quality required for IR devices. Current materials characterization studies of dilute-nitride films consisting of more than two group-V elements has yielded conflicting information related to their competing behavior and the extent of N incorporation. Due to challenges related to light-element microanalysis for many characterization techniques, and the small concentrations of N involved, it is difficult to quantify the amount of N incorporated into dilute-nitride films. In this study, we use transmission electron microscopy (TEM), energy-dispersive spectroscopy (EDS), and x-ray diffraction (XRD) to study the incorporation behaviors of the competing group-V elements in InAsSbN films.

A GaN/AlGaN multiple-quantum-well structure based on an asymmetric triple-quantum-well repeat unit was grown by molecular beam epitaxy, and its vertical electrical transport characteristics were investigated as a function of temperature. To minimize the density of dislocations and other structural defects providing leakage current paths, homoepitaxial growth on a free-standing GaN substrate was employed. The measured vertical-transport current-voltage characteristics were found to be highly nonlinear, especially at low temperatures, consistent with sequential tunneling through the ground-state subbands of weakly coupled adjacent quantum wells. Furthermore, different turn-on voltages were measured depending on the polarity of the applied bias, in accordance with the asymmetric subband structure of the sample repeat units.

Due to their large conduction-band offsets, GaN/Al(Ga)N quantum wells are currently the subject of extensive research efforts aimed at extending the spectral range of intersubband optoelectronic devices towards shorter and shorter wavelengths. Here we report our recent measurement of optically pumped intersubband light emission from GaN/AlN quantum wells at the record short wavelength of about 2 μm. Nanosecond-scale optical pulses are used to resonantly pump electrons from the ground states to the second excited subbands, followed by radiative relaxation into the first excited subbands. The intersubband origin of the measured photoluminescence is confirmed via an extensive study of its polarization properties and pump wavelength dependence.

The electrical properties of Ni-based ohmic contacts N-face p-type GaN are presented. The specific contact resistance of N-face p-GaN exhibits a liner decrease from 1.01 × cm2 to 9.05 × 10-3 Ω cm2 for the as-deposited and the annealed Ni/Au contacts, respectively, with increasing annealing temperature Furthermore, the specific contact resistance could be decreased by four orders of magnitude to 1.03 × 10-4 Ω cm2 as a result of surface treatment using an alcohol-based (NH4)2S solution. The depth profile data measured by the intensity of O1s core peak in the x-ray photoemission spectra showed that the alcohol-based (NH4)2S treatment was effective in removing of the surface oxide layer of GaN. In addition, a Ga 2p core-level peak showed a red-shift of binding energy by 0.3 eV by alcohol-based (NH4)2S treatment, indicating that the surface Fermi level was shifted toward the valence-band edge. Thus, the low ohmic contact behavior observed in our treated sample might be explained in terms of the removal of the oxide layer and reducing the barrier heights by reduced band-bending effect.

Ultrathin (∼10 nm) InN ion selective field effect transistors (ISFETs) show a current variation ratio of 3.5 % per pH decade with a response time of less than 10 s. When the ISFET is employed as an electrolyte FET, the current variation of 18 % was measured as the gate bias changes from zero to 0.3 V given a drain-source voltage of 0.1 V. The high current (resistance) variation ratio is attributed to the ultrathin epilayer and an unusual phenomenon of intrinsic strong electron accumulation on InN surface, which enables a chemical/biological sensor with high sensitivity and resolution and permits detection of a slight concentration variation of the electrolyte. The pH response measurement of 10-nm-thick InN ISFETs investigated was performed in an aqueous solution titrated with diluted NaOH and HCl. The Helmholtz potential built at the electrolyte-InN interface is governed by direct adsorption of H+ ions at the surface metal oxides, modulating the channel current of the InN ISFETs. The channel current monotonically decreases as the pH value of an aqueous solution increases from 2 to 10. The sensitivity and resolution were found to be 58.3 mV per decade and 0.02 pH change, respectively. Besides, the detection of DNA hybridization was further performed after the InN surface was modified with MPTMS and probe DNA. A complementary target DNA solution of 100 nM led to a current decrease of approximate 6 uA, corresponding to the current variation of 0.74 %. The hybridization between negatively charged complementary DNA and the immobilized probe DNA caused the depletion of carriers at the InN surface, suppressing the channel current. The functionalized InN ISFETs are suitable for genetic analysis in clinical diagnostics without any labeling reagent. Such an InN-based sensor is appealing in the regime of chemical and biological sensing applications.

Chloride ion concentration can be used as a biomarker for the level of pollen exposure in allergic asthma, chronic cough and airway acidification related to respiratory disease. AlGaN/GaN high electron mobility transistor (HEMT) with an InN thin film in the gate region was used for real time detection of chloride ion detection. The InN thin film provided surface sites for reversible anion coordination. The sensor exhibited significant changes in channel conductance upon exposure to various concentrations of NaCl solutions. The sensor was tested over the range of 100 nM to 100 μM NaCl solutions. The effect of cations on the chloride ion detection was also studied.

We report on a method based on cross-sectional scanning photoelectron microscopy and spectroscopy (XSPEM/S) for studying electronic structure of III-nitride surfaces and interfaces on a submicrometer scale. Cross-sectional III-nitride surfaces prepared by in situ cleavage were investigated to eliminate the polarization effects associated with the interface charges/dipoles normal to the cleaved surface. In contrast to the as-grown polar surfaces which show strong surface band bending, the cleaved nonpolar surfaces have been found to be under the flat-band conditions. Therefore, both doping and compositional junctions can be directly visualized at the cleaved nonpolar surfaces. Additionally, we show that the “intrinsic” valence band offsets at the cleaved III-nitride heterojunctions can be unambiguously determined.

Source material purification according to a thermodynamic analysis is reported for the sublimation crystal growth of aluminum nitride in an inert reactor. OAlOH is strongly favored over all other possible oxygen containing compounds in both the Al-O-H-N and Al-O-H-C-N systems, while Al2O, proved to be the most favorable oxygen containing gas species for Al-O-N system in previous study, become secondary favorable gas species. A low temperature (<1200 °C) treatment is effective in eliminating oxygen and hydrogen from the source powder. Carbon monoxide is another important oxygen containing gas species in the Al-O-H-C-N system, and is favored over Al2O at certain temperature and pressure. Carbothermal reduction with intentionally added carbon (graphite) can further reduce the oxygen concentration. Experiments show that high-temperature sintering minimizes the oxygen concentration and reduces the specific surface area of the source. With only 5.5% of mass loss, the purification produced a source with low O, H, and C concentrations of 0.018 wt%, 6ppm, and 0.006wt%.

Antibody-functionalized, Au-gated AlGaN/GaN high electron mobility transistors (HEMTs) were used to detect Perkinsus marinus. The antibody was anchored to the gate area through immobilized thioglycolic acid. The AlGaN/GaN HEMT were grown by a molecular beam epitaxy system (MBE) on sapphire substrates. Infected sea waters were taken from the tanks in which Tridacna crocea infected with P. marinus were living and dead. The AlGaN/GaN HEMT showed a rapid response of drain-source current in less than 5 seconds when the infected sea waters were added to the antibody-immobilized surface. The recyclability of the sensors with wash buffers between measurements was also explored. These results clearly demonstrate the promise of field-deployable electronic biological sensors based on AlGaN/GaN HEMTs for Perkinsus marinus detection.

There has been significant recent interest in the use of surface-functionalized thin film and nanowire wide bandgap semiconductors, principally GaN, InN, ZnO and SiC, for sensing of gases, heavy metals, UV photons and biological molecules. For the detection of gases such as hydrogen, the semiconductors are typically coated with a catalyst metal such as Pd or Pt to increase the detection sensitivity at room temperature. Functionalizing the surface with oxides, polymers and nitrides is also useful in enhancing the detection sensitivity for gases and ionic solutions. The wide energy bandgap of these materials make them ideal for solar-blind UV detection, which can be of use for detecting fluorescence from biotoxins. The use of enzymes or adsorbed antibody layers on the semiconductor surface leads to highly specific detection of a broad range of antigens of interest in the medical and homeland security fields. We give examples of recent work showing sensitive detection of glucose, lactic acid, prostate cancer and breast cancer markers and the integration of the sensors with wireless data transmission systems to achieve robust, portable sensors.

In this paper, we report the development of AlGaN-based deep ultraviolet LEDs by rf plasma-assisted molecular beam epitaxy (MBE) emitting between 277 and 300 nm. Some of these devices were evaluated after fabrication at bare-die and some at wafer-level configurations. Devices with total optical output of 1.3 mW at injection current of 200 mA were produced, with maximum external quantum efficiency (EQE) of 0.16%. These performance values are equivalent to those reported for deep UV-LEDs grown by the Metalorganic chemical vapor deposition (MOCVD) method and measured at bare-die configuration. In parallel, we have evaluated the internal quantum efficiency (IQE) of AlGaN quantum wells, and found that such wells emitting at 250 nm have an IQE of 50%. From the analysis of these data, we concluded that the efficiency of deep UV LEDs is not limited by the IQE but by the light extraction efficiency, injection efficiency or a combination of both.

In this work, europium implanted InGaN/GaN SL with a fixed well/barrier thickness ratio grown by metal-organic chemical-vapor deposition (MOCVD) on GaN/(0001) sapphire substrate were investigated. The as-grown and Eu ion implanted InGaN/GaN SLs were annealed at different temperatures ranging from 600°C to 950°C in nitrogen ambient. The quality of the SL interfaces in undoped and implanted structures has been investigated by X-ray diffraction (XRD) at room temperature. The characteristic satellite peaks of SLs were measured for the (0002) reflection up to the second order in the symmetric Bragg geometry. The XRD simulation spectrum of the as-grown SL agrees well with the experimental results. The simulation results show x=0.06 atomic percent the InGaN well sub-layers, with thicknesses of 2.4 and 3.3 nm for single InGaN well and GaN barrier, respectively. It was observed that annealing of the undoped SL does not significantly affect the interfacial quality of the superstructure, whereas, the Eu ion implanted InGaN/GaN SL undergo partial induced degradation. Annealing the implanted SLs shows a gradual improvement of the multilayer periodicity and a reduction of the induced degradation with increasing the annealing temperature as indicated by the XRD spectra.