III-V compounds such as InGaAs, InAs, InSb have great potential for future low power high speed devices (such as MOSFETs, QWFETs, TFETs and NWFETs) application due to their high carrier mobility and drift velocity. The development of good quality high k gate oxide as well as high k/III-V interfaces is prerequisite to realize high performance working devices. Besides, the downscaling of the gate oxide into sub-nanometer while maintaining appropriate low gate leakage current is also needed. The lack of high quality III-V native oxides has obstructed the development of implementing III-V based devices on Si template. In this presentation, we will discuss our efforts to improve high k/III-V interfaces as well as high k oxide quality by using chemical cleaning methods including chemical solutions, precursors and high temperature gas treatments. The electrical properties of high k/InSb, InGaAs, InSb structures and their dependence on the thermal processes are also discussed. Finally, we will present the downscaling of the gate oxide into sub-nanometer scale while maintaining low leakage current and a good high k/III-V interface quality.

The crystal structure of a-plane GaN/ZnO heterostructures on r-plane sapphire was investigated by using the XRD and TEM measurment. It was found the formation of (220) ZnGa2O4 and crystal orientation of semipolar (10$\bar 1$3) GaN at GaN/ZnO interface. The epitaxial relation of normal surface direction are the sapphire (1$\bar 1$02) // a-GaN (11$\bar 2$0) and ZnGa2O4 (220) // semi-polar GaN (10$\bar 1$$\bar 3$). Beside, the emission peak energy of ZnO appears shift about 60 meV in the GaN/ZnO/GaN heterostructures due to the re-crystallization of ZnO layer with Ga or N atom and the formation of the localized state.

This article presents the use of flexible metal foam substrates for the growth of III-nitride nanowire light emitters to tackle the inherent limitations of thin-film light emitting diodes as well as fabrication and application issues of traditional substrates. A dense packing of gallium nitride nanowires were grown on a nickel foam substrate. The nanowires grew predominantly along the a-plane direction, normal to the local surface of the nickel foam. Strong luminescence was observed from undoped GaN and InGaN quantum well light emitting diode nanowires.

Nowadays, the nature of the non radiative recombination centres in ZnO is a matter of controversy; they have been related to extended defects, zinc vacancy complexes, and surface defects, among other possible candidates. We present herein the optical characterization of catalyst free ZnO nanorods grown by atmospheric MOCVD by microRaman and cathodoluminescence spectroscopies. The correlation between the defect related Raman modes and the cathodoluminescence emission along the nanorods permits to establish a relation between the non radiative recombination centers and the defects responsible for the local Raman modes, which have been related to Zn interstitial complexes.

Composite rods consisting of Alumina (Al2O3) and Silicon Carbide whiskers (SiCw) are used to fabricate microwave cooking racks because they effectively act as a microwave intensification system that allows cooking at much faster rates than conventional microwave ovens. The percolation behavior, electrical conductivity and dielectric properties of these materials have been reported previously. However, it has been observed that the electrical response of the extruded bars is a function of the rod length and that long rods show substantially different behavior than thinner disks cut from them. A percolation model has been proposed that describes the effect of the alignment of the semiconducting SiC whiskers and the quality of the interfaces present in the composite rods: SiC-SiC and SiC-Al2O3-SiC for example. This study was undertaken with the goal of testing out whether the response of the individual sections could be used to generate the response of the full length rods and to assess the importance of the homogeneous distribution of the SiC fillers on the resultant impedance response.

This paper details the development of a technique to improve the minority carrier lifetime of 4H-SiC thick (≥ 100 μm) n-type epitaxial layers through multiple thermal oxidations. A steady improvement in lifetime is seen with each oxidation step, improving from a starting ambipolar carrier lifetime of 1.09 µs to 11.2 µs after 4 oxidation steps and a high-temperature anneal. This multiple-oxidation lifetime enhancement technique is compared to a single high-temperature oxidation step, and a carbon implantation followed by a high-temperature anneal, which are traditional ways to achieve high ambipolar lifetime in 4H-SiC n-type epilayers. The multiple oxidation treatment resulted in a high minimum carrier lifetime of 6 µs, compared to < 2 µs for other treatments. The implications of lifetime enhancement to high-voltage/high-current 4H-SiC power devices are also discussed.

A physics based model is presented to describe the surface donor density distribution for metal/AlGaN/GaN structures. This model partly relies on experimental observations to describe the reduction that takes place in surface donor density when the metal gate is deposited. This new model is based on our previous work on the bare surface barrier height for both unrelaxed and partially relaxed barrier layers. The model predictions are consistent with reported experimental data.

Blue light-emitting diodes (LED's), utilizing InGaN-based multi-quantum well (MQW) active regions deposited by organometallic chemical vapor epitaxy (OMVPE), are one of the fundamental building-blocks for current solid-state lighting applications. Studies [1,2] have previously been conducted to explore the optical and physical properties of the active MQW's over a variety of different OMVPE growth conditions. However, the conclusions of these papers have often been contradictory, possibly due to a limited data set or lack of understanding of the fundamental fluid dynamics and gas-phase chemistry that occurs during the deposition process.

Multi-quantum well structures grown over a range of pressures from typical low-pressure production processes at 200 Torr, up to near-atmospheric growth conditions at 700 Torr, have been investigated in this study. At all growth pressures, clear trends of gas-phase chemical reactions are observed for increased gas residence times (lower gas speeds from the injector flange and lower rotation rates) and increased V/III ratios (higher NH3 flows).

Confocal microscopy, excitation-dependent PL (PLE), and time-resolved photo-luminescence (TRPL) have been employed on these MQW structures to investigate the carrier lifetime characteristics. Confocal emission images show spatially-separated bright and dark regions. The bright regions are red-shifted in wavelength relative to the dark regions, suggesting microscopic spatial localization of high indium content regions. As the growth pressure and gas residence times are reduced, a larger difference in band-gap between bright and dark regions, longer lifetimes, and higher average PL intensities can be obtained, indicating that higher optical quality material can be realized. Optimized MQW's grown at high pressure exhibit higher PLE slope intensities and IQE characteristics than lower pressure samples. Results on simple LED structures indicate that the improvement in MQW optical quality at high pressures translates to higher output power at a 110 A/cm2 injection current density.

In this work, we investigated the influence of N-polar wet etching on the properties of nitride-based hexagonal pyramids array (HPA) vertical-injection light emitting diodes (V-LEDs). The cathodeluminescence images showed the randomly distribution of hexagonal pyramids with isolated active regions. The transmission electron microscopy images demonstrated the reduced density of threading dislocations. The IQE was estimated by temperature dependence of photoluminescence, which showed 30% increase for HPA V-LEDs compared with broad area (BA) V-LEDs. The improved extraction efficiency was verified by finite difference time domain simulation, which was 20% higher than that of roughened BA V-LEDs. The electrical properties of HPA V-LEDs were measured by conductive atomic force microscopy (CAFM) measurements. HPA V-LEDs exhibited much lower leakage current due to the improved crystal quality.

Hybrid silicon laser is a promising solution to enable high-performance light source on large-scale, silicon-based photonic integrated circuits (PICs). As a compact laser cavity design, hybrid microring lasers are attractive for their intrinsic advantages of small footprint, low power consumption and flexibility in wavelength division multiplexing (WDM), etc. Here we review recent progress in unidirectional microring lasers and device thermal management. Unidirectional emission is achieved by integrating a passive reflector that feeds laser emission back into laser cavity to introduce extra unidirectional gain. Up to 4X of device heating reduction is simulated by adding a metal thermal shunt to the laser to “short” heat to the silicon substrate through buried oxide layer (BOX) in the silicon-on-insulator (SOI) substrate. Obvious device heating reduction is also observed in experiment.

A study about the achievement of dichromatic white light-emitting diodes (LEDs) was performed. A series of dual wavelength LEDs with different last quantum-well (LQW) structure were fabricated. The bottom seven blue light QWs (close to n-GaN layer) of the four samples were the same. The LQW of sample A was 3 nm, and that of sample B, C and D were 6 nm, a special high In content ultra-thin layer was inserted in the middle of the LQW of sample C and on top of that of sample D. XRD results showed In concentration fluctuation and good interface quality of the four samples. PL measurements showed dual wavelength emitting, the blue light peak position of the four samples were almost the same, sample A with a narrower LQW showed an emission wavelength much shorter than that of sample B, C, D. EL measurement was done at an injection current of 100 mA. Sample A only showed LQW emission due to holes distribution. Because of wider LQW, the emission wavelength of sample B, C and D was longer and peak intensity was weaker. Sample D with insert layer on top of LQW showed strongest yellow light emission with a blue peak. As the injection current increased, sample A showed highest output light power due to narrower LQW. Of the other three samples with wider LQW, sample D showed highest output power. Effective yellow light emission has always been an obstacle to the achievement of dichromatic white LED. Sample D with insert layer close to p-GaN can confine the hole distribution more effectively hence the recombination of holes and electrons was enhanced, the yellow light emission was improved and dichromatic white LED was achieved.

Cadmium sulfide (CdS) films were deposited onto glass substrates by chemical bath deposition (CBD) from a bath containing cadmium acetate, ammonium acetate, thiourea, and ammonium hydroxide. The CdS thin films were annealed in argon (neutral atmosphere) or hydrogen (reducing atmosphere) for 1 h at various temperatures (300, 350, 400, 450 and 500 °C). The changes in optical and electrical properties of annealed treated CdS thin films were analyzed. The results showed that, the band-gap and resistivity depend on the post-deposition annealing atmosphere and temperatures. Thus, it was found that these properties of the films, were found to be affected by various processes with opposite effects, some beneficial and others unfavorable. The energy gap and resistivity for different annealing atmospheres was seen to oscillate by thermal annealing. Recrystallization, oxidation, surface passivation, sublimation and materials evaporation were found the main factors of the heat-treatment process responsible for this oscillating behavior. Annealing over 400 °C was seen to degrade the optical and electrical properties of the film.

In this paper, we demonstrate deposition methods and conditions that allow the control of the electrical properties of doped ZnTe grown by RF magnetron sputtering using both nitrogen and copper as dopants. The carrier density of the films was characterized using a van der Pauw Hall effect measurement method. We demonstrate how the concentration of nitrogen in the plasma during the growth of the film impacts the conductivity of the ZnTe films. Films with hole concentrations in excess of 1018 cm-3 and a high degree of crystallinity were successfully grown. Similarly, we demonstrate that the hole concentration in the Cu-doped ZnTe can be varied by varying the amount of copper introduced in the films. We also observe that annealing the copper doped ZnTe films increases the carrier density, whereas annealing the nitrogen doped ZnTe films causes a decrease in carrier concentration and conductivity.

The feasibility of using a photoconductor with a Ga2O3/CuGaSe2 heterojunction for visible light sensors was investigated. CIGS chalcopyrite semiconductors have both a high absorption coefficient and high quantum efficiency. However, their dark current is too high for image sensors. In this study, we applied gallium oxide (Ga2O3) as a hole-blocking layer for CIGS thin film to reduce the dark current. Experimental results showed that the dark current was drastically reduced, and an avalanche multiplication phenomenon was observed at an applied voltage of over 6 V. However, this structure had sensitivity only in the ultraviolet light region because its depletion region was almost completely spread in the Ga2O3 layer since the carrier density of the Ga2O3 layer was much lower than that of the CIGS layer. These results indicate that the Ga2O3/CuGaSe2 heterojunction has potential for use in visible light sensors but that we also need to increase the carrier density of the Ga2O3 layer to shift the depletion region to the CIGS film.

We study ZnO-NiO mixed crystal thin film as a wide band p-type material for the hetero-junction with ZnO. As for the hetero-junction of the ZnO ( n-type ) and the NiO which have relatively stable p-type semiconductor characteristics, there are issues on the crystallographic mismatch and the band offset of the valence band as well as the conduction band . We made the ZnO-NiO mixed crystal thin film in all composition range with the substrate temperature of 250°C, using magnetron sputtering process and acquired the basic data for the change of electrical conductivity with conduction type. In addition, a high-quality thin film was made by using a Pulse Laser Deposition ( PLD ) , and the band diagram of the ZnO-NiO mixed crystal system was illustrated from the analyses of XPS, NEXAFS and optical absorption measurements. As a result, the offset of ZnO-NiO mixed crystal film is proportionally decreasing with increasing the content of ZnO in NiO film. And the characteristics of the diode with the hetero-junction of ZnNiO/ZnO were improved compared with that of NiO/ZnO. The reasons were discussed with the data of the band offset, the crystalline of the films and the interface properties with the NiO/ZnO and the ZnNiO/ZnO.

A ZnO single crystal is a native substrate for epitaxial growth of high-quality thin films of ZnO-based Group II-oxides (e.g. ZnO, ZnMgO, ZnCdO) for variety of devices, such as UV and visible-light emitting diodes (LEDs), UV laser diodes and solar-blind UV detectors. Currently, commercially available ZnO single crystal wafers are produced using a hydrothermal technique. The main drawback of hydrothermal growth technique is that the ZnO crystals contain large amounts of alkaline metals, such as Li and K. These alkaline metals are electrically active and hence can be detrimental to device performances. In this paper, results from a recently developed novel growth technique for ZnO single crystal boules are presented. Lithium-free ZnO single crystal boules of up to 1 inch in diameter was demonstrated using the novel technique. Results from crystal growth and materials characterization will be discussed.